Particle Induced X-Ray Emission
Particle Induced X-Ray Emission (PIXE) uses a high-energy (MeV) ion beam to bombard the sample surface. X-ray emissions provide chemical information about the elements present in the sample. PIXE measures trace impurities in bulk materials or thin-films deposited on substrates like silicon or bulk crystalline materials. These measurements are non-destructive, and standard-less.
Instruments:
- 2.5 MV Van de Graaff accelerator with NEC RC 43 end station and nuclear microprobe.
